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TU Dresden » Faculty of Mechanical Science and Engineering » Institute for Materials Science » Chair of Materials Science and Nanotechnology
molecular computing equipment; 4 Lab workstations with wafer cleaning facilities; Cleaning, etching, Ultrasonic annealing, spin coating on Si and glass wafers: LF-workstations
» equipment   » 4 Lab workstations with wafer cleaning facilities; Cleaning, etching, Ultrasonic annealing, spin coating on Si and glass wafers LF-workstations


LF-workstations

( 4 Lab workstations with wafer cleaning facilities; Cleaning, etching, Ultrasonic annealing, spin coating on Si and glass wafers)




name:LF-workstations
date:2002.05.27
type:4 Lab workstations with wafer cleaning facilities; Cleaning, etching, Ultrasonic annealing, spin coating on Si and glass wafers,
responsible:
location:MBZ
producer:Stangl Semiconductor Equipment AG
brand name:(Nasschemische Arbeitsplätze)
more infos:data sheet



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last modified: 2017.09.19 Di
author: webadmin

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